ISO 17560:2002
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Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
| Published By | Publication Date | Number of Pages |
| ISO | 2002-07 | 18 |
ISO 17560:2002 specifies a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon, and using stylus profilometry or optical interferometry for depth scale calibration. This method is applicable to single-crystal, poly-crystal or amorphous-silicon specimens with boron atomic concentrations between 1×1016 atoms/cm3 and 1×1020 atoms/cm3, and to crater depths of 50 nm or deeper.
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