ASTM-F518:1991 Edition

$40.63

F518-77(1991)E01 Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)

Published By	Publication Date	Number of Pages
ASTM	1991	5

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Description

ASTM F518-77-E01-Reapproved1991

Withdrawn Standard: Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)

ASTM F518

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ICS Code

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Additional information

Standard Title	F518-77(1991)E01 Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)
Published Code	ASTM
Publication Date	1991
Pages Count	5